How Does The PVD Process Work?

The PVD process uses vacuum, target material (e.g. Titanium), heat, electrical potential
and gasses such as nitrogen to deposit a coating on the substrate. The substrate is put
into the chamber and connected to electrical source to enable a potential voltage difference.
The chamber is evacuated and heated to high temperatures (100-600°C). A small amount
of gas (Nitrogen for TiN) is bled into the PVD chamber. A plasma cloud is then ignited which
evaporates the target material and deposits the coating on the substrate in a controlled and
precise manner. Different target materials and gasses are used to create different coatings
with different properties. These PVD coatings can increase the Rockwell 'C' hardness of
steel up to 4 times that of plain steel as well as reduce the coefficient of friction. MORE>>